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AX7695 Remote Plasma Source

AX7695 Remote Plasma Source

The R*evolution® III integrated remote plasma source provides reactive gas required for semiconductor wafer processing. AX7695 integrates a quartz vacuum chamber, RF power supply and all necessary controls into a compact, self-contained unit for easy installation directly on the tool process chamber for an extremely clean, low cost source of atomic radicals to bring about the desired reaction on the wafer, at a reduced level of complexity.

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Essential details：AX7695 Remote Plasma Source

The R*evolution® III integrated remote plasma source provides reactive gas required for semiconductor wafer processing. AX7695 integrates a quartz vacuum chamber, RF power supply and all necessary controls into a compact, self-contained unit for easy installation directly on the tool process chamber for an extremely clean, low cost source of atomic radicals to bring about the desired reaction on the wafer, at a reduced level of complexity.

AX8407

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AX7695 Remote Plasma Source

Ozone is an environmentally friendly alternative to many chemical processes. It has a high redox potential, can be generated at the point of use and is easily converted back to oxygen. Typical semiconductor ozone applications include TEOS/Ozone CVD, Ta2 O5 CVD, photoresist strip, wafer cleaning, contaminant removal, surface conditioning, oxide growth, and ALD. Ozone is also ideally suited for use in pharmaceutical and water processing applications including cleaning, sterilization and disinfection, as well as Clean-In-Place (CIP).
The SEMOZON AX8407 generator converts pure oxygen into ozone through silent electrical discharge and achieves high output and high concentration level. It requires only minute levels of dopant nitrogen gas, far below the levels required for competitive ozone generators. As a result, the presence of contaminants, e.g. NOx compounds, is extremely low.

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