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AX7670-60 REACTIVE GAS GENERATOR

AX7670-60 REACTIVE GAS GENERATOR

The ASTRON®i reactive gas generator is designed for increased flow capability and process flexibility. The ASTRONi reactive gas generator eliminates the need for argon during processing, allows a choice of ignition gas compatible with existing process gases, and increases overall flow for decreased processing time and increased throughput.

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Overview


Essential details:AX7670-60 REACTIVE GAS GENERATOR

The ASTRON®i reactive gas generator is designed for increased flow capability and process flexibility. The ASTRONi reactive gas generator eliminates the need for argon during processing, allows a choice of ignition gas compatible with existing process gases, and increases overall flow for decreased processing time and increased throughput.
Based on patented Low-Field-Toroidal plasma technology, the ASTRONi reactive gas generator provides a broader range of operating pressures while maintaining a high input gas dissociation rate. The high reliability, field-proven design architecture combines the power source, control module, and plasma chamber. The result is a compact, lid-mountable unit, which is easy to integrate.
The primary application for the ASTRONi reactive gas generator is as a remote source for reactive gas to clean undesired deposits from interior walls of CVD or FPD process chambers where greater process flexibility is required. By generating atomic fluorine that reacts with waste deposits in the chamber, new gases are formed that are readily scrubbed to minimize the environmental impact. In addition, the remote source reduces wear and tear on the process chamber compared to in situ RF methods.

AX7670-60

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AX7670-60 REACTIVE GAS GENERATOR

Features & Benefits
• No Argon required during operation
• Increased flow reduces chamber clean time
• Continuous operation (CW), not duty cycle limited, to support large chambers and/or long clean times
• Compatible with 200mm and 300mm chambers
• Choice of ignition gases for flexibility and lower CoO
• Compact, lid-mountable design, for easy integration
• High dissociation rate over broad pressure range for more robust operation with chamber clean hardware configurations